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  • High Purity Gold Sputting Target
  • High Purity Gold Sputting Target
  • High Purity Gold Sputting Target
High Purity Gold Sputting TargetHigh Purity Gold Sputting TargetHigh Purity Gold Sputting Target

High Purity Gold Sputting Target

Item name: Gold Sputting Target

Melting point(℃):1064

Boiling point(℃): 2808

Describtion: It is soft, dense, malleable, ductile, and an excellent conductor of heat and electricity. Deposited films of gold are used as layers in the production of semiconductors, sensors, batteries, and data storage.

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Gold sputter target 99.99% Au/gold sputtering target


Description:

The pure Au plane target is a pure metal target used for vacuum coating. The target material has uniform structure, refined grains, high surface finish and high dimensional accuracy.


Specification:

Product Name

Gold/Au sputtering target

Available Purity(%)

99.99(4N),99.999(5N)

Shape

Rectangle, Round

Size

As your request

Melting point(℃)

1064

Density(g/cm³)

19.32

Boiling point(℃)

2808

Technology

Vacuum Melting, Patented thermo-mechanical process and machine work

Application

Semiconductors, Micro-electronics and Magnetic Data Storage etc.


Gold Sputtering Target

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